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When the coating to be applied is especially thin, the best results are achieved in the vacuum. We control the chemical reactions and reduce impurities to a minimum. After all, extremely fine coatings can reach their potential only with a high degree of purity. Our atomically anchored nanolayers are based on two advanced vacuum coating processes: 1.Cathodic arc evaporation: Physical vapour deposition (PVD) vapourises metal, ionises it and then hurls it onto the workpiece in an electric field. Reactive gases make it easy to create surfaces such as carbides, oxides or nitrides. 2.Plasma Enhanced Chemical Vapour Deposition (PECVD): This application enables gaseous substances to be deposited on the substrate at less than 200 °C. Unlike conventional chemical vapour deposition, reactions occur at significantly less than 1000 °C. This technology is ideal for extremely hard "diamond-like carbon" coatings.
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