Thin Film Applications of the UHV-TPD Workstation

A successful method for investigating the microstructure of thin films by thermal effusion measurements is Temperature Programmed Desorption (TPD), also known as Thermal Desorption Spectrometry (TDS) or Thermal Desorption Analysis (TDA). Analysis by TPD involves positioning the sample in an Ultra High Vacuum (UHV) chamber and heating the sample at different linear temperature ramp rates while collecting the desorption spectra using a quadrupole mass spectrometer. The desorption process must be measured in UHV conditions to eliminate contaminating elements from the study. The Hiden TPD Workstation is a complete experimental setup designed for this and many other applications and is optimised to obtain maximum sensitivity for desorption species ranged from 1 – 300 amu.

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