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![500 Degrees Clean Oven](https://images.findtheneedle.co.uk/findtheneedle/products/12292194.jpg)
Annealing at 400 to 500°C including dehydro-annealing in the film-forming process of low temperature polysicon TFT,activation annealing after ion doping and hydrogenated annealing. High temperature uniformity performance with a powerful air conditioning system and enhanced temperature heat-up and pull-down has dramatically improved processing capacity. Low oxygen concentration,below 10ppm (optional), makes the system usable for organic EL film-forming process before sealing.
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