Clean Oven

Used extensively in baking, heat treatment/drying of semiconductor wafers, liquid crystals, disks and other components and devices requiring clean air conditions.In addition to the standard instrumentation which offers two-step programming, the M-instrumentation allows programmed operation in up to 18 steps.Class 100 cleanliness is achieved by employing a HEPA filter and a back-to-front laminar circulation system.The high-performance model (PVHC model) provides stable performance even during heat-up or cooling at high temperatures of 150°C(+302°F) or more.Compatible with the chamber network, E-BUS system.

For more information on Clean Oven talk to Unitemp Ltd