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For the examination of all the components present in your chamber or evolved from your system •CVD / PECVD / RIE / LPCVD / MOCVD•Vacuum Coating / Plasma Etching•Sputter Deposition•Contamination Studies•Base Pressure Fingerprint•Leak Detection / Virtual Leaks / desorption•Outgassing / Bakeout / Pump Performance•Chamber / Process gas contaminants The HPR-30 process gas analysis system is a compact gas analysis system for monitoring residual gases and vacuum processes, featuring: •Compact bench-top / mobile cart / console rack construction.•Direct re-entrant orifice with differential pumping for optimum sensitivity / response.•Continuous sampling from 1 mbar to 10-4 mbar.•High Sensitivity (to 5 ppb), mass range options to 1000 amu.•Soft Ionisation for the analysis of complex organics / appearance MS studies.•Stability (less than ±0.5% height variation over 24 h).•MASsoft control via RS232, RS485 or Ethernet LAN.•Pneumatic valve control for automatic operation with manual override and fail-safe isolator in case of power failure or overpressure.•Automated simultaneous data acquisition / analysis with local display alarm panels.
For more information on Process Gas Analyser - HPR-30 talk to Hiden Analytical Ltd
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