Quantitative Gas Analyser for Reactive / Corrosive Species - HPR-80

Rapid, quantitative analysis of reactive / corrosive mixtures in your chamber / produced in your process •Plasma / Reactive ion Etch Studies•CVD / PVD / MOCVD•Semiconductor wafer-fab studies•Vacuum / Plasma Processing•Quantitative analysis of reactive species•HF, HCl, HBr, and CFC processes studies Hiden HPR-80, a specifically designed system for high performance corrosive gas analysis and monitoring for semiconductor and vacuum processes, featuring: •Heated Electro-polished heated flexible bellows, quick coupling port connector.•Purged, inert viscous flow QIC calibration inlet for quantitative analyses.•High Sensitivity (to 5 ppb), Mass to 2500 amu.•1 mTorr to Atmosphere sampling pressure operation.•Capacitance manometer for species independent pressure monitoring.•Stability (less than ±0.5% height variation over 24h).•MASsoft control via RS232, RS485 or Ethernet LAN.•Matrix Inversion, Normalisation and Single Peak Referencing.

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