MA200 Automatic Mask Aligner for Substrates and Wafers up to 200mm

MA200 Automatic Mask Aligner for Substrates and Wafers up to 200mm The MA200 Gen3 offers intelligent solutions for high volume applications. Its various alignment options, flexible optics and special add-ons make it an all-purpose tool for multiple handling and processing needs. Features and capabilities include: - Compact, space saving design, ideal for production environments on up to 200mm wafers - Excellent ergonomics and ease of use for setup and operation - Automatic mask management system stores up to 20 photomasks in a controlled environment - For an integrated lithography solution the MA200 Gen3 allows clustering with a coat/bake/develop module - Options include: Flow box, Angular exposure of Steep to Perpendicular Sidewalls, SECS-II/GEM etc.

For more information on MA200 Automatic Mask Aligner for Substrates and Wafers up to 200mm talk to Inseto (UK) Ltd