MJB4 Mask Aligner for Pieces, Small Substrates and Wafers up to 100mm

MJB4 Mask Aligner for Pieces, Small Substrates and Wafers up to 100mm. The compact, easy to use MJB4 provides unsurpassed results and is perfect for research and low volume photolithography applications. System features and capabilities include: - Processing of fragile, warped or part wafers and pieces from a few millimetres up to 100mm - Compact robust design, ideal for research environments with resolution down to 0.5 microns - UV250/300/400 Broadband optics with fast switching between different wavelengths - Precision alignment with either split or single field microscopes with an IR alignment option - Wedge Error Compensation (WEC) for optimal parallelism between substrate and mask - Upgradable with a retrofit kit for UV-Nanoimprint Lithography

For more information on MJB4 Mask Aligner for Pieces, Small Substrates and Wafers up to 100mm talk to Inseto (UK) Ltd